Today, i just want to show the image of electrode.
The smallest size is 50 nm.
I used A11 for the base PMMA.
The A11 PMMA was mixed with A thinner to obtain A3~4.
The mixed PMMA shows also good resolution.
And the lift-off of pmma is very fast.
We also tried patterning using A1 PMMA.
Lift-off process was really hard.
Our PMMA was rapidly lift-off.
The pattern was not clean.
I'm going to make more clean and shape pattern for 20 nm.
If you have a good idea, do not hesitate to contact me!
I want to share the good information about e-beam lithography.
Moreover, I want to share about graphene and boron nitride as well!
Moreover, I want to share about graphene and boron nitride as well!
The figure shows electrodes size of 100, 50, 250, 100, 100, 200, 200, 200 nm.
See you~:)
Long time no see Dr. Lee! I'm Charlie. Can you give me a lecture about very basic things of E-beam lithography in here your blog? Thank you :D
ReplyDeleteHello~ charlie.
ReplyDeleteHow are you? Okay, i think the preparing method for e-beam lithography is quite important.
I'm going to give you the talk for that.
Whenever you have a time, come to my office.
Let's discuss it.